Polycrystalline ZnO Films Deposited on Glass by RF Reactive Sputtering

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    摘要 PolycrystallineZnOfilmswerepreparedonglasswaferusingZntargetsbyradiofrequency(RF)reactivesputteringtechniqueunderdifferentdepositionconditions.X-raydiffraction(XRD)andopticaltransmittancespectrumwereemployedtoanalyzethestructureandopticalcharacterofthefilms.Thestrainandstressinfilms,aswellasthepackingdensityarecalculatedintermsofrefractiveindexoffilmsmeasuredwithanellipticpolarizationanalyzer.ItisthedepositionconditionsthathavegreateffectsonthestructuralandopticalpropertiesofZnOfilms.Undertheoptimalconditions,theonlyevidentpeakinXRDspectrumwas(002)peakwiththefullwidthathalfmaximum(FWHM)of0.20°showingthegrainsizeof42.8nm.Thepackingdensity,thestressin(002)planeandtheaverageopticaltransmittanceinthevisibleregionwereabout97%,-1.06×109N/m2and92%,respectively.
    机构地区 不详
    出版日期 2004年02月12日(中国Betway体育网页登陆平台首次上网日期,不代表论文的发表时间)
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