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Low Temperature Plasma CVD Grown Graphene by Microwave Surface-Wave Plasma CVD Using Camphor Precursor

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DOI lj11w3e7jv/1638744

作者 Hideo Uchida;Hare Ram Aryal;Sudip Adhikari;Masayoshi Umeno

机构地区不详

出处《物理科学与应用：英文版》 2016年2期

关键词微波等离子体化学气相沉积石墨微波等离子体CVD 热化学气相沉积低温等离子体过程

分类 [理学][物理]

出版日期 2016年02月12日（中国Betway体育网页登陆平台首次上网日期，不代表论文的发表时间）

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来源期刊

物理科学与应用：英文版

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微波等离子体化学气相沉积石墨微波等离子体CVD 热化学气相沉积低温等离子体过程

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