Manufacturing tolerant topology optimization-中国Betway体育网页登陆

摘要 Inthispaperwepresentanextensionofthetopologyoptimizationmethodtoincludeuncertaintiesdur-ingthefabricationofmacro,microandnanostructures.Morespecifically,weconsiderdevicesthataremanufacturedusingprocesseswhichmayresultin(uniformly)toothin(eroded)ortoothick(dilated)structurescomparedtotheintendedtopology.ExamplesareMEMSdevicesmanufacturedusingetchingprocesses,nano-devicesmanufacturedusinge-beamlithographyorlasermicro-machiningandmacrostructuresmanufacturedusingmillingprocesses.Inthesuggestedrobusttopologyoptimizationapproach,under-andover-etchingismodelledbyimageprocessing-based'erode'and'dilate'operatorsandtheoptimizationproblemisfor-mulatedasaworstcasedesignproblem.Applicationsofthemethodtothedesignofmacrostructuresforminimumcomplianceandmicrocompliantmechanismsshowthatthemethodprovidesmanufacturingtolerantdesignswithlittledecreaseinperformance.Asapositivesideeffecttherobustdesignformulationalsoeliminatesthelongstandingprob-lemofone-nodeconnectedhingesincompliantmechanismdesignusingtopologyoptimization.

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Manufacturing tolerant topology optimization

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