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《等离子体科学与技术:英文版》
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2000年2期
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Study of SiO2 Films Prepared by Electron Cyclotron Resonant Microwave Plasma
Study of SiO2 Films Prepared by Electron Cyclotron Resonant Microwave Plasma
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摘要
未填写
DOI
34g88gp3j9/1044055
作者
张劲松;任兆杏;梁荣庆;隋毅峰;刘卫
机构地区
不详
出处
《等离子体科学与技术:英文版》
2000年2期
关键词
分类
[核科学技术][核技术及应用]
出版日期
2000年02月12日(中国Betway体育网页登陆平台首次上网日期,不代表论文的发表时间)
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来源期刊
等离子体科学与技术:英文版
2000年2期
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